Flip-chip packaging substrate and method for fabricating the same

ABSTRACT

A flip-chip packaging substrate and a method for fabricating the same are disclosed. The method includes stacking a plurality of insulating layers having conductive posts in a manner that the conductive posts are stacked on and in contact with one another. The insulating layers and the conductive posts serve as a core layer structure of the flip-chip packaging substrate. As such, the conductive posts having small-sized end surfaces can be fabricated according to the practical need. Therefore, when the thickness of the core layer structure is increased, the present disclosure not only increases the rigidity of the flip-chip packaging substrate so as to avoid warping, but also ensures the design flexibility of the small-sized end surfaces of the conductive posts, allowing high-density electrical connection points and fine-pitch and high-density circuit layers to be fabricated on the core layer structure.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Divisional of application Ser. No. 16/404,856filed on May 7, 2019 which is incorporated herein by reference.

This application claims the benefit of priority from Taiwanese PatentApplication No. 107115944 filed on May 10, 2018, the entire contents ofwhich is incorporated herein by reference.

BACKGROUND 1. Technical Field

The present disclosure relates to flip-chip packaging substratetechnologies, and, more particularly, to a flip-chip packaging substrateused in a semiconductor packaging process and a method for fabricatingthe same.

2. Description of Related Art

In recent years, industry applications have been gradually developedtoward 5G high-frequency communication, AR, VR, etc. Accordingly,high-end semiconductor packaging technologies are increasingly demandedso as to be applied in semiconductor flip-chip packages or multi-chippackages such as AI chips, high-end chips and multi-chips. As such,semiconductor packages are required to have an increased packaging size,an increased number of stacking layers, and circuits of high density,fine pitch and high electrical connection point count.

Currently, core layers of flip-chip packaging substrates have anincreased thickness so as to meet the requirements of highly integratedchips such as AI chips, more electrical connection points count and avariety of complex circuits and prevent warping from occurring. However,it also results in an increased cross-section size of through holes inthe core layer, thereby increasing the pitch between the electricalconnection points and hence reducing the number of the electricalconnection points per unit area, reducing the circuit density andincreasing the circuit pitch. Accordingly, the flip-chip packagingsubstrates have to become much larger and thicker, thereby increasingthe difficulty of the packaging process.

Therefore, flip-chip packaging substrates having a large size of such as45 mm×45 mm, 70 mm×70 mm or 80 mm×80 mm are used to carry highlyintegrated chips such as AI chips, high-end chips or multi-chips. FIG.1A is schematic cross-sectional view of a conventional electronic device1. The electronic device 1 has a circuit board 18, a large-sizeflip-chip packaging substrate 1 a disposed on the circuit board 18, anda highly integrated semiconductor chip 19 bonded to the flip-chippackaging substrate 1 a. Referring to FIG. 1B, the flip-chip packagingsubstrate 1 a has a core layer 10, a build-up structure 11 formed oneach of upper and lower sides of the core layer 10, and a solder masklayer 12 formed on the build-up structure 11. A plurality of conductivethrough holes 100 are formed in the core layer 10 for electricallyconnecting circuit layers 110 of the build-up structures 11. Each of thebuild-up structures 11 further has at least a dielectric layer 111encapsulating the circuit layers 110. The outermost circuit layer 110 ofthe build-up structure 11 is exposed from the corresponding solder masklayer 12 to serve as electrical connection points 112. The circuit board18 and the semiconductor chip 19 can further be bonded to the electricalconnection points 112 through a solder material 13.

Conventionally, the core layer 10 is made of glass fiber combined withepoxy resin, for example, BT (Bismaleimide Triazine) or FR5. To form theconductive through holes 100 in the core layer 10, a plurality ofopenings are formed by mechanical or laser drilling. In an embodiment,referring to FIG. 1C, the conductive through hole 100′ consists of twotapered vias. Thereafter, a conductive layer is formed in the openingsby electroplating or a filling material is filled in the openings toform the conductive through holes 100, 100′ of FIGS. 1B and 1C or toform conductive through holes consisting of a conductive material 100 aand an insulating material 100 b as shown in FIG. 1D.

However, the conventional large-size flip-chip packaging substrate 1 ahas some drawbacks. For example, due to different CTEs (coefficients ofthermal expansion) between the core layer 10 of glass fiber combinedwith epoxy resin and the other layers of the flip-chip packagingsubstrate 1 a, warping may occur to the packaging substrate 1 a during apackaging process, thus adversely affecting the electrical connectionbetween the packaging substrate 1 a and the semiconductor chip 19 (forexample, the solder material 13′ therebetween cracks or does not bondthe packaging substrate 1 a and the semiconductor chip 19 together) oradversely affecting the electrical connection between the packagingsubstrate 1 a and the circuit board 18 (for example, the solder material13″ therebetween cracks or does not bond the packaging substrate 1 a andthe circuit board 18 together). More seriously, the semiconductor chip19 may electrically fail or crack due to stresses.

Therefore, the thickness h of the core layer 10 is increased, forexample, from 0.8 mm (in combination with the width w of the opening of0.1 mm) to 1.2 mm (the width w of the opening is above 0.2 mm) toincrease the rigidity and avoid warping of the packaging substrate 1 a.However, such a packaging substrate has more drawbacks.

First, the number of the electrical connection points per unit areacannot be increased. In particular, due to the increased thickness ofthe core layer 10, the size of the end surfaces of the conductivethrough holes 100, 100′ (i.e., the width w of the openings) and hencethe pitch between the conductive through holes 100, 100′ are increased,thereby reducing the number of the electrical connection points per unitarea.

Second, the circuit pitch is increased and the circuit density isreduced. In particular, due to the increased thickness of the core layer10, the size of the end surfaces of the conductive through holes 100,100′ is increased, thereby occupying more space and hence reducing thespace available for the circuit layers 110. Consequently, it isdifficult to fabricate the circuit layers 110 with fine pitch and highdensity.

Third, it becomes more difficult to perform electroplating and fillingof the filling material in the conductive through holes 100, 100′. Inparticular, the increased thickness of the core layer 10 causes theconductive through holes 100, 100′ to be deep. As such, it becomes moredifficult to perform electroplating and filling of the filling material100 b in the conductive through holes 100, 100′. For example, voidedthrough holes may be formed in the deep conductive through holes 100,100′.

Fourth, as the thickness of the core layer 10 is increased, the cost anddifficulty in fabricating the conductive through holes 100, 100′ arealso increased. In particular, since the core layer 10 is made of adielectric material containing glass fiber, when a laser or mechanicaldrilling process is performed to form deep conductive through holes 100,100′ in the core layer 10, it is difficult to form small-sized endsurfaces for the conductive through holes 100, 100′. In addition, thefabrication cost is high.

Therefore, how to overcome the above-described drawbacks has becomecritical.

SUMMARY

In view of the above-described drawbacks, the present disclosureprovides a method for fabricating a flip-chip packaging substrate, whichcomprises the steps of: providing a carrier with a first insulatinglayer formed on the carrier; forming a plurality of first conductiveposts in the first insulating layer; forming at least a secondinsulating layer on the first insulating layer, wherein the firstinsulating layer and the second insulating layer serve as an insulatingportion; forming a plurality of second conductive posts in the secondinsulating layer in a manner that the second conductive posts arestacked on and in contact with the first conductive posts, wherein thesecond conductive posts and the first conductive posts serve asconductive portions, and the insulating portion and the conductiveportions serve as a core layer structure having opposite first andsecond surfaces; removing the carrier; and forming a circuit portion onthe first and second surfaces of the core layer structure at the same ordifferent times with the circuit portion electrically connected to theconductive portions.

The present disclosure provides another method for fabricating aflip-chip packaging substrate, which comprises the steps of: providing acarrier with a plurality of conductive posts stacked on and in contactwith one another on the carrier, wherein the conductive posts serve asconductive portions; forming on the carrier an insulating portion thatencapsulates the conductive portions, wherein the insulating portion andthe conductive portions serve as a core layer structure having oppositefirst and second surfaces; removing the carrier; and forming a circuitportion on the first and second surfaces of the core layer structure atthe same or different times with the circuit portion electricallyconnected to the conductive portions.

The present disclosure provides a further method for fabricating aflip-chip packaging substrate, which comprises the steps of: providingan insulating portion having opposite first and second sides; forming aplurality of first openings on the first side of the insulating portion;forming on the second side of the insulating portion a plurality ofsecond openings corresponding in position to the first openings, whereincorresponding ones of the first and second openings communicate witheach other; forming first conductive posts in the first openings, andforming second conductive posts in the second openings, in a manner thatthe first conductive posts and the second conductive posts are stackedon and in contact with one another, wherein the second conductive postsand the first conductive posts serve as conductive portions, and theinsulating portion and the conductive portions serve as a core layerstructure having opposite first and second surfaces; and forming acircuit portion on the first and second surfaces of the core layerstructure at the same or different times with the circuit portionelectrically connected to the conductive portions.

In an embodiment, the conductive posts can be formed by electroplating,deposition or filling.

The present disclosure further provides a flip-chip packaging substrate,which comprises: a plurality of conductive portions, each of which has aplurality of conductive posts stacked on and in contact with oneanother; an insulating portion encapsulating the conductive portions,wherein the insulating portion and the conductive portions serve as acore layer structure having opposite first and second surfaces; and acircuit portion formed on at least one of the first and second surfacesof the core layer structure and electrically connected to the conductiveportions.

In an embodiment, end surfaces of the conductive posts that are stackedon one another can have the same or different sizes. In anotherembodiment, the end surfaces of the first conductive posts and thesecond conductive posts have the same or different sizes.

In an embodiment, the insulating portion can be made of an organicdielectric material free of glass fiber (for example, a solder maskmaterial) or an inorganic dielectric material free of glass fiber (forexample, an insulating oxide). In another embodiment, the organicdielectric material can further comprise a molding compound, an epoxymolding compound (EMC) or a primer.

In an embodiment, the circuit portion can be a single-layer circuit or abuild-up layer.

In an embodiment, the conductive portions can be directly or indirectlyelectrically connected to the circuit portion.

According to the present disclosure, when the thickness of theinsulating portion is increased so as to increase the rigidity of theflip-chip packaging substrate, the end surfaces of the conductiveportions do not need to be increased. Even further, the end surfaces ofthe conductive portions can be reduced. Compared with the prior art, thepresent disclosure not only increases the rigidity of the flip-chippackaging substrate so as to avoid warping, but also allowsminiaturization design of the end surfaces of the conductive portionsaccording to the practical need. Therefore, the present disclosureincreases the number of electrical connection points per unit area andallows fabrication of fine-pitch and high-density circuit layers so asto meet the packaging requirement of highly integrated chips.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1A is a schematic cross-sectional view of a conventional electronicdevice;

FIG. 1B is a schematic cross-sectional view of a conventional packagingsubstrate;

FIGS. 1C and 1D are schematic cross-sectional views of variousconventional conductive through holes;

FIGS. 2A to 2F are schematic cross-sectional views showing a method forfabricating a flip-chip packaging substrate according to a firstembodiment of the present disclosure, wherein FIG. 2B′ is a schematicupper view of FIG. 2B; FIG. 2C′ shows another embodiment of FIG. 2C;FIG. 2D′ is a schematic upper view of FIG. 2D; FIG. 2E′ is a schematicpartially perspective view of FIG. 2E; and FIG. 2F′ shows anotherembodiment of FIG. 2F;

FIG. 2F-1 shows another embodiment of FIG. 2F;

FIG. 2F-2 shows another embodiment of FIG. 2F′;

FIG. 2G is a schematic cross-sectional view showing application of FIG.2F-1 ;

FIG. 2G′ is a schematic cross-sectional view showing application of FIG.2F-2 ;

FIGS. 3A to 3G are schematic cross-sectional views showing a method forfabricating a flip-chip packaging substrate according to a secondembodiment of the present disclosure, wherein FIG. 3G′ shows anotherembodiment of FIG. 3G;

FIG. 3H is a schematic cross-sectional view showing application of FIG.3G;

FIG. 3H′ is a schematic cross-sectional view showing application of FIG.3G′;

FIGS. 4A to 4D are schematic cross-sectional views showing a method forfabricating a flip-chip packaging substrate according to a thirdembodiment of the present disclosure, wherein FIG. 4D′ shows anotherembodiment of FIG. 4D;

FIG. 4E is a schematic cross-sectional view showing application of FIG.4D;

FIG. 4E′ is a schematic cross-sectional view showing application of FIG.4D′; and

FIGS. 5A to 5E are schematic cross-sectional views showing a core layerstructure of a flip-chip packaging substrate according to differentembodiments of the present disclosure.

DETAILED DESCRIPTION OF EMBODIMENTS

The following illustrative embodiments are provided to illustrate thedisclosure of the present disclosure, these and other advantages andeffects can be apparent to those in the art after reading thisspecification.

It should be noted that all the drawings are not intended to limit thepresent disclosure. Various modifications and variations can be madewithout departing from the spirit of the present disclosure. Further,terms such as “first”, “second”, “third”, “a” etc. are merely forillustrative purposes and should not be construed to limit the scope ofthe present disclosure.

FIGS. 2A to 2F are schematic cross-sectional views showing a method forfabricating a flip-chip packaging substrate 3, 3′ according to a firstembodiment of the present disclosure.

Referring to FIG. 2A, the thickness of a core layer structure 2 (asshown in FIG. 2E) is determined according to the packaging requirementand hence the number of the layers of the core layer structure 2 isdetermined (in an embodiment, as shown in FIG. 2E, two layers areprovided). Then, a first insulating layer 21 is formed on a carrier 20,and a plurality of first through holes 210 are formed in the firstinsulating layer 21 through a patterning process.

In an embodiment, the first insulating layer 21 is formed by molding,coating or lamination. In another embodiment, the first insulating layer21 is made of an organic dielectric material without glass fiber (forexample, a solder mask material), or an inorganic dielectric materialwithout glass fiber (for example, an insulating oxide). In yet anotherembodiment, the organic dielectric material further contains a moldingcompound, an epoxy molding compound (EMC) or a primer.

Further, since the first insulating layer 21 has a small thickness, thefirst through holes 210 having small-sized end surfaces can be easilyand quickly formed in the first insulating layer 21 by laser.

Referring to FIG. 2B, a plurality of first conductive posts 22 areformed in the first through holes 210 of the first insulating layer 21.

In an embodiment, referring to FIG. 2B′, no circuit extends around thefirst conductive posts 22.

Further, the first conductive posts 22 can be formed by electroplatingor deposition. Alternatively, the first conductive posts 22 can beformed by filling a conductive material such as a solder paste or aconductive adhesive in the first through holes 210.

Referring to FIG. 2C, a second insulating layer 23 is formed on thefirst insulating layer 21 and a patterning process is performed to forma plurality of second through holes 230 in the second insulating layer23 for exposing the first conductive posts 22.

In an embodiment, the second insulating layer 23 is formed by molding,coating or lamination. In another embodiment, the second insulatinglayer 23 is made of an organic dielectric material without glass fiber(for example, a solder mask material), or an inorganic dielectricmaterial without glass fiber (for example, an insulating oxide). In yetanother embodiment, the organic dielectric material further contains amolding compound, an epoxy molding compound (EMC) or a primer.

Further, since the second insulating layer 23 has a small thickness, thesecond through holes 230 having small-sized end surfaces can be easilyand quickly formed in the second insulating layer 23 by laser.

In an embodiment, the width t of the second through holes 230 can be thesame as or different from the width r of the first through holes 210. Inanother embodiment, the width t of the second through holes 230 is lessthan the width r of the first through holes 210. In yet anotherembodiment, referring to FIG. 2C′, the width t′ of the second throughholes 230 is greater than the width r′ of the first through holes 210.

Referring to FIG. 2D, continued from the process of FIG. 2C, a pluralityof second conductive posts 24 are formed in the second through holes 230of the second insulating layer 23 by electroplating, deposition orfilling. The second conductive posts 24 are stacked on and in contactwith the first conductive posts 22. The width d1 of the first conductiveposts 22 (about 0.06 mm) is different from the width d2 (about 0.04 mm)of the second conductive posts 24. As such, a step-shaped interface S isformed between ends surfaces of the first conductive posts 22 and thecorresponding second conductive posts 24.

In an embodiment, referring to FIG. 2D′, no circuit extends around thesecond conductive posts 24.

Referring to FIG. 2E, the carrier 20 is completely removed to expose endsurfaces 22 a of the first conductive posts 22 and a surface 21 a of thefirst insulating layer 21.

In an embodiment, the first insulating layer 21 and the secondinsulating layer 23 can be regarded as an insulating portion 2 a, andthe first conductive posts 22 and the second conductive posts 24 stackedthereon can be regarded as conductive portions 2 b, as shown in FIG.2E′. The insulating portion 2 a and the conductive portions 2 b serve asa core layer structure 2 of the flip-chip packaging substrate 3. Thecore layer structure 2 has opposite first and second surfaces 20 a, 20b.

Since the core layer structure 2 is formed by stacking a plurality ofinsulating layers, the total thickness of the core layer structure 2 canbe increased while maintaining the design of small-sized openings andfine pitch. In an embodiment, the thickness L of the core layerstructure 2 is required to be 1.2 mm, and the core layer structure 2 canbe formed by stacking two insulating layers each having a thickness of0.6 mm. In another embodiment, referring to FIG. 2D, both the thicknesst1 of the second insulating layer 23 and the thickness t2 of the firstinsulating layer 21 are 0.6 mm. In yet another embodiment, referring toFIGS. 5A to 5D, the core layer structure 2 can be formed by stackingthree insulating layers each having a thickness of 0.4 mm As such, sinceeach of the insulating layers has a small thickness, the conductiveposts can be fabricated with small-sized end surfaces, therebyeffectively increasing the number of the electrical connection pointsper unit area, increasing the circuit density and reducing the circuitpitch.

Further, the molding compound or primer of the insulating portion 2 ahas good rigidity to prevent warping. Therefore, the carrier 20 can becompletely removed without causing warping of the core layer structure2.

Referring to FIG. 2F, a circuit portion 2 c is formed on the core layerstructure 2. The circuit portion 2 c can be a single-layer circuit. Inan embodiment, the circuit portion 2 c has a first circuit layer 250formed on the first surface 20 a of the core layer structure 2 andelectrically connected to the first conductive posts 22 and a secondcircuit layer 260 formed on the second surface 20 b of the core layerstructure 2 and electrically connected to the second conductive posts24. The first circuit layer 250 and the second circuit layer 260 can beformed at the same or different times. In an embodiment, the firstcircuit layer 250 is directly electrically connected to the firstconductive posts 22, and the second circuit layer 260 is directlyelectrically connected to the second conductive posts 24. In anotherembodiment, referring to FIG. 2F′, the first circuit layer 250 isindirectly electrically connected to the first conductive posts 22through a plurality of conductive pads 220 and the second circuit layer260 is indirectly electrically connected to the second conductive posts24 through a plurality of conductive pads 240.

In an embodiment, the circuit portion 2 c′ can be a build-up layer. Thatis, the number of the circuit layers can be designed according to thepractical need. In an embodiment, referring to a flip-chip packagingsubstrate 3′ of FIG. 2F-1 , the circuit portion 2 c′ has a first circuitstructure 35 formed on the first surface 20 a of the core layerstructure 2. The first circuit structure 35 has at least a firstdielectric layer 351 and a plurality of first circuit layers 350 bondedto the first dielectric layer 351. The first circuit layers 350 can bedirectly electrically connected to the first conductive posts 22 (asshown in FIG. 2F-1 ) or indirectly electrically connected to the firstconductive posts 22 through a plurality of conductive pads 220 (as shownin FIG. 2F-2 ). An insulating layer 37 a is formed on the first circuitstructure 35 and the outermost first circuit layer 350 is exposed fromthe insulating layer 37 a to serve as conductive pads 352 for mountingsolder bumps (not shown). Further, the circuit portion 2 c′ has a secondcircuit structure 36 formed on the second surface 20 b of the core layerstructure 2. The second circuit structure 36 has at least a seconddielectric layer 361 and a plurality of second circuit layers 360 bondedto the second dielectric layer 361. The second circuit layers 360 can bedirectly electrically connected to the second conductive posts 24 (asshown in FIG. 2F-1 ), or indirectly electrically connected to the secondconductive posts 24 through a plurality of conductive pads 240 (as shownin FIG. 2F-2 ). An insulating layer 37 b is further formed on the secondcircuit structure 36 and the outermost second circuit layer 360 isexposed from the insulating layer 37 b to serve as conductive pads 362for mounting solder bumps 38.

In an embodiment, the first and second dielectric layers 351, 361 aremade of an epoxy resin, such as ABF, prepreg or EMC. In anotherembodiment, the insulating layers 37 a, 37 b are made of a solder maskmaterial, such as photosensitive ink, ABF or a non-photosensitivedielectric material such as EMC.

In an embodiment, the circuit portion 2 c, 2 c′ is electricallyconnected to the first or second conductive posts 22, 24 through theconductive pads 220, 240, and an additional heat dissipating effect canbe achieved.

Subsequently, referring to an electronic package 3″ of FIG. 2G or 2G′,an electronic component 30 is disposed in a flip-chip manner on thesecond circuit layer 260 of the flip-chip packaging substrate 3 or theconductive pads 362 of the flip-chip packaging substrate 3′ through aplurality of conductive bumps 31 and/or the solder bumps 38. Further, anunderfill 32 is formed to encapsulate the conductive bumps 31 and/or thesolder bumps 38 or an encapsulant (not shown) is formed to encapsulatethe electronic component 30. In an embodiment, a plurality of conductiveelements 39, such as solder balls, are formed on the first circuit layer250 of the flip-chip packaging substrate 3 or the conductive pads 352 ofthe flip-chip packaging substrate 3′ for bonding with a circuit board(not shown).

The electronic component 30 is an active element, such as asemiconductor chip, a passive element, such as a resistor, a capacitoror an inductor, or a combination thereof.

The encapsulant can be a thin film used in a lamination process, amolding compound used in a molding process or an adhesive used in aprinting process. The encapsulant can be made of polyimide, a dry film,an epoxy resin, or a molding compound.

When the thickness L of the core layer structure 2 (or the insulatingportion 2 a) is increased, for example, from 0.8 mm to 1.2 or 1.6 mm soas to increase the rigidity of the flip-chip packaging substrate 3, 3′,the width d1 of the first conductive posts 22 or the width d2 of thesecond conductive posts 24 can be designed to be 0.04 mm to 0.06 mm,which is far less than the width of the openings (above 0.1 or 0.2 mm)formed by the conventional drilling process. Therefore, compared withthe prior art, the present disclosure can minimize the size of the endsurfaces of the conductive portions 2 b so as to increase the circuitdensity of the first circuit layers 250, 350 or the second circuitlayers 260, 360 and increase the number of the conductive pads 352, 362per unit area.

Further, the insulating portion 2 a can be made of a high-rigiditymaterial so as to prevent warping. As such, a high-rigidity flip-chippackaging substrate 3, 3′ can be obtained without the need to furtherincrease the thickness L of the core layer structure. In an embodiment,the thickness L of the core layer structure 2 is maintained at 0.8 mm,each of the two insulating layers has a thickness of 0.4 mm, and thewidth d1 of the first conductive posts 22 or the width d2 of the secondconductive posts 24 is 0.04 mm to 0.06 mm.

In another embodiment, the number of the stacking layers of theconductive portions 2 b, the size of the end surfaces of the conductiveposts or the layout of the circuit layers can be designed according tothe practical need. FIGS. 5A to 5C show conductive portions 5 a, 5 b and5 c according to different embodiments of the present disclosure.Referring to FIGS. 5A to 5C, each of the conductive portions 5 a, 5 band 5 c has a first conductive post 22, a second conductive post 24 anda third conductive post 50 stacked on one another. The end surfaces ofthe first, second and third conductive posts can have the same ordifferent sizes. As shown in FIG. 5A, the width of the second conductivepost 24 is less than the width of the first conductive post 22 butgreater than the width of the third conductive post 50. As shown in FIG.5B, the width of the second conductive post 24 is less than those of thefirst and third conductive posts 22, 50. As shown in FIG. 5C, the widthof the second conductive post 24 is greater than those of the first andthird conductive posts 22, 50. Further, referring to FIG. 5D, the secondcircuit layer 260 on the conductive portion 5 a is dispensed with.Referring to FIG. 5E, the width a of the second circuit layer 56 is lessthan the width of the end surface of the conductive portion 2 b (or thewidth d2 of the second conductive post 24).

FIGS. 3A to 3G are schematic cross-sectional views showing a method forfabricating a flip-chip packaging substrate 3, 3′ according to a secondembodiment of the present disclosure. The second embodiment differs fromthe first embodiment in the fabrication process of the core layerstructure.

Referring to FIG. 3A, a first resist layer 91 is formed on a carrier 20,and a plurality of first open areas 910 are formed in the first resistlayer 91 through a patterning process.

In an embodiment, the first resist layer 91 is made of a photoresistmaterial and the open areas are formed by image transfer (exposure anddevelopment).

Referring to FIG. 3B, a plurality of first conductive posts 22 areformed in the first open areas 910 of the first resist layer 91 byelectroplating or deposition.

Referring to FIG. 3C, a second resist layer 92 is formed on the firstresist layer 91 and a patterning process is performed to form aplurality of second open areas 920 in the second resist layer 92 forexposing the first conductive posts 22.

In an embodiment, the second resist layer 92 is made of a photoresistmaterial and the open areas are formed by image transfer (exposure anddevelopment).

Further, the width of the second open areas 920 can be the same as ordifferent from the width of the first open areas 910.

Referring to FIG. 3D, a plurality of second conductive posts 24 areformed in the second open areas 920 of the second resist layer 92 byelectroplating or deposition, and the second conductive posts 24 arestacked on and in contact with the first conductive posts 22.

Referring to FIG. 3E, the first and second resist layers 91, 92 areremoved, and the first and second conductive posts 22, 24 serve asconductive portions 2 b.

Referring to FIG. 3F, an insulating portion 2 a′ is formed on thecarrier 20 to encapsulate the conductive portions 2 b. As such, theinsulating portion 2 a′ and the conductive portions 2 b serve as a corelayer structure 2′, which is similar to the core layer structure 2 ofFIG. 2D. The core layer structure 2′ differs from the core layerstructure 2 in the insulating portion 2 a, 2 a′.

Referring to FIGS. 3G and 3G′, continued from the process of FIG. 2D,processes such as removing the carrier 20, forming the circuit portion 2c, 2 c′ (optionally forming the conductive pads 220, 240) and apackaging process can be performed, as shown in FIG. 3H or 3H′.

FIGS. 4A to 4D are schematic cross-sectional views showing a method forfabricating a flip-chip packaging substrate 4, 4′ according to a thirdembodiment of the present disclosure. The third embodiment differs fromthe first embodiment in the fabrication process of the core layerstructure.

Referring to FIG. 4A, an insulating portion 4 a having a first side 40 aand a second side 40 b opposite to the first side 40 a is provided. Aplurality of first openings 410 are formed on the first side 40 a of theinsulating portion 4 a and a plurality of second openings 430 are formedon the second side 40 a of the insulating portion 4 a, corresponding inposition to the first openings 410. The corresponding ones of the firstand second openings 410, 430 communicate with each other.

Referring to FIG. 4B, a seed layer 80 is formed on the first side 40 aand the second side 40 b of the insulating portion 4 a and in the firstopenings 410 and the second openings 430. Then, a resist layer 90 isformed on the first side 40 a and the second side 40 b of the insulatingportion 4 a and a plurality of open areas 900 are formed in the resistlayer 90 for communicating with the first openings 410 and the secondopenings 430 and exposing portions of the seed layer on the first side40 a and the second side 40 b of the insulating portion 4 a.

Referring to FIG. 4C, a metal material 46 is formed in the open areas900, the first openings 410 and the second openings 430. The metalmaterial 46 in the first openings 410 serves as first conductive posts42. The metal material 46 in the second openings 430 serves as secondconductive posts 44. The first conductive posts 42 and the secondconductive posts 44 stacked on and integrally formed with the firstconductive posts 42 serve as conductive portions 4 b. The insulatingportion 4 a and the conductive portions 4 b serve as a core layerstructure 2″.

Referring to FIG. 4D, the resist layer 90 and the seed layer 80 underthe resist layer 90 are removed. The metal material 46 in the open areas900 serves as a circuit portion 4 c. As such, a flip-chip packagingsubstrate 4 is formed. The circuit portion 4 c is electrically connectedto the conductive portions 4 b. The core layer structure 2″ has a firstsurface 20 a and a second surface 20 b corresponding to the first side40 a and the second side 40 b of the insulating portion 40,respectively.

In an embodiment, the conductive portions 4 b and the circuit portion 4c are integrally formed through the same process.

Further, the circuit portion 4 c can be a single-layer circuit, as shownin FIG. 4D or 4D′, or the circuit portion 4 c′ is a redistributionlayer, as shown in FIG. 4E or 4E′.

Furthermore, the circuit portion 4 c, 4 c′ is directly electricallyconnected to the first conductive posts 42 or the second conductiveposts 44, as shown in FIG. 4D or 4E. Alternatively, referring to FIG.4D′ or 4E′, the circuit portion 4 c, 4 c′ is indirectly electricallyconnected to the first conductive posts 42 or the second conductiveposts 44 through conductive pads 420, 440. The conductive pads 420, 440are integrally formed with the circuit portion 4 c, 4 c′.

In addition, referring to FIG. 4E or 4E′, after the flip-chip packagingsubstrate 4, 4′ is fabricated, the packaging process of FIG. 2G or 2G′is performed to obtain an electronic package 4″.

The present disclosure further provides a flip-chip packaging substrate3, 3′, 4, 4′, which has: a plurality of conductive portions 2 b, 4 b,each of which has at least a first conductive post 22 and a secondconductive post 24 stacked on and in contact with one another; aninsulating portion 2 a, 2 a′, 4 a encapsulating the conductive portions2 b, 4 b, wherein the insulating portion 2 a, 2 a′, 4 a and theconductive portions 2 b, 4 b serve as a core layer structure 2, 2′, 2″having opposite first and second surfaces 20 a, 20 b ; and a circuitportion 2 c, 2 c′, 4 c,4 c′ formed on the first and second surfaces 20a, 20 b of the core layer structure 2, 2′, 2″ and electrically connectedto the conductive portions 2 b, 4 b.

The width d1 of the first conductive post 22 can be the same as ordifferent from the width d2 of the second conductive post 24. As such,the conductive portion 2 b has an even peripheral surface or an unevenperipheral surface. For example, a step-shaped interface S is formedbetween the ends surfaces of the first conductive post 22 and the secondconductive post 24.

In an embodiment, the insulating portion 2 a, 2 a′, 4 a is made of adielectric material. In another embodiment, the dielectric material isan organic dielectric material without glass fiber (for example, asolder mask material) or an inorganic dielectric material without glassfiber (for example, an insulating oxide). In yet another embodiment, theorganic dielectric material can further contain a molding compound, anepoxy molding compound (EMC) or a primer.

In an embodiment, the circuit portion 2 c, 2 c′, 4 c, 4 c′ is asingle-layer circuit (for example, the first circuit layer 250 and thesecond circuit layer 260 or aspects of FIGS. 4D and 4D′) or aredistribution layer (for example, the first circuit structure 35, thesecond circuit structure 36 or aspects of FIGS. 4E and 4E′).

In an embodiment, the conductive portions 2 b, 4 b are directly (asshown in FIGS. 2F, 2F-1, 3G, 4D and 4E) or indirectly (as shown in FIGS.2F′, 2F-2,3G′, 4D′ and 4E′) electrically connected to the circuitportion 2 c, 2 c′, 4 c, 4 c′.

The core layer structure 2, 2′, 2″ according to the present disclosurefacilitates to increase the number of the electrical connection pointsper unit area and meet the requirements of fine-pitch and high-densitycircuits. In particular, it has following advantages.

First, the number of the electrical connection points per unit area iseffectively increased. In particular, although the total thickness ofthe core layer structure 2, 2′, 2″ is increased, each sub-layer of theinsulating portion 2 a, 2 a′, 4 a (for example, the first insulatinglayer 21, the second insulating layer 23 or insulating sectionscorresponding to the conductive posts) has a small thickness, and hencethe size of the end surfaces of the conductive posts of each sub-layercan be minimized Therefore, the conductive portions 2 b, 4 b of the corelayer structure 2, 2′, 2″ can be formed with fine pitch, therebyeffectively increasing the electrical connection points per unit area.

Second, fine-pitch and high-density circuits are obtained. Inparticular, although the total thickness of the core layer structure 2,2′, 2″ is increased, each sub-layer of the insulating portion 2 a, 2 a′,4 a (for example, the first insulating layer 21, the second insulatinglayer 23 or insulating sections corresponding to the conductive posts)has a small thickness, and hence the size of the end surfaces of theconductive posts of each sub-layer can be minimized Therefore, theconductive portions 2 b, 4 b of the core layer structure 2, 2′, 2″ canbe formed with fine pitch, thereby effectively reducing the surface areaof the insulating portion 2 a, 2 a′, 4 a occupied by the end surfaces ofthe conductive posts and increasing the layout area of the circuitlayers. As such, the present disclosure reduces limitations on circuitlayout and is capable of fabricating fine-pitch and high-densitycircuits.

Third, the conductive portions 2 b, 4 b have a low fabrication cost. Inparticular, although the total thickness of the core layer structure 2,2′, 2″ is increased, each sub-layer of the insulating portion 2 a, 2 a′,4 a (for example, the first insulating layer 21, the second insulatinglayer 23 or insulating sections corresponding to the conductive posts)has a small thickness. As such, the openings in each sub-layer (such asthe first and second through holes 210, 230 and the first and secondopenings 410, 430) can be easily and quickly formed. Further, goodquality and high yield can be achieved no matter whether anelectroplating process or a filling process is performed. Therefore, thefabrication cost is reduced.

Fourth, warping is effectively prevented from occurring during thepackaging process. In particular, the increased thickness of the corelayer structure 2, 2′, 2″ leads to good rigidity so as to meet thepackaging requirement of highly integrated chips and prevent warpingfrom occurring.

According to the present disclosure, even if the total thickness of thecore layer structure is increased, the conductive portions withsmall-sized end surfaces can be readily fabricated according to thepractical need. Therefore, the present disclosure not only preventswarping from occurring during the packaging process, but also hasadvantages of increasing the number of the electrical connection pointsper unit area, allowing fabrication of fine-pitch and high-densitycircuit layers and reducing the fabrication cost so as to meet thepackaging requirement of highly integrated chips such as AI chips andensure application stability.

The above-described descriptions of the detailed embodiments are only toillustrate the preferred implementation according to the presentdisclosure, and it is not to limit the scope of the present disclosure.Accordingly, all modifications and variations completed by those withordinary skill in the art should fall within the scope of presentdisclosure defined by the appended claims

What is claimed is:
 1. A method for fabricating a flip-chip packagingsubstrate, comprising: providing an insulating portion having oppositefirst and second sides; forming a plurality of first openings on thefirst side of the insulating portion; forming on the second side of theinsulating portion a plurality of second openings corresponding inposition to the first openings, wherein corresponding ones of the firstand second openings communicate with each other; forming firstconductive posts in the first openings, and forming second conductiveposts in the second openings, in a manner that the first conductiveposts and the second conductive posts are stacked on and in contact withone another, wherein the second conductive posts and the firstconductive posts serve as conductive portions, and the insulatingportion and the conductive portions serve as a core layer structurehaving opposite first and second surfaces; and forming a circuit portionof a build-up type on the first and second surfaces of the core layerstructure at the same or different times with the circuit portionelectrically connected to the conductive portions, wherein two ends ofthe first conductive posts are free from being formed with padstructures, wherein two ends of the second conductive posts are freefrom being formed with pad structures, wherein the circuit portionincludes circuit structures formed on the first and second surfaces ofthe core layer structure, wherein the circuit structures include aplurality of dielectric layers and a plurality of circuit layers bondedto the dielectric layers, and wherein the circuit layers have verticalportions and horizontal portions, the vertical portions of the circuitlayers are directly and electrically connected to the first conductiveposts and the second conductive posts, and the dielectric layers arespaced between the horizontal portions of the circuit layers and thecorresponding first and second surfaces of the core layer structure. 2.The method of claim 1, wherein end surfaces of the first conductiveposts and the second conductive posts have the same size.
 3. The methodof claim 1, wherein the insulating portion of the core layer structureis made of an organic dielectric material free of glass fiber or aninorganic dielectric material free of glass fiber.
 4. A flip-chippackaging substrate, comprising: a plurality of conductive portions eachhaving a plurality of conductive posts stacked on and in contact withone another; an insulating portion encapsulating the conductiveportions, wherein the insulating portion and the conductive portionsserve as a core layer structure having opposite first and secondsurfaces; and a circuit portion of a build-up type formed on at leastone of the first and second surfaces of the core layer structure andelectrically connected to the conductive portions wherein two ends ofthe conductive posts are free from being formed with pad structures,wherein the circuit portion includes circuit structures formed on thefirst and second surfaces of the core layer structure, wherein thecircuit structures include a plurality of dielectric layers and aplurality of circuit layers bonded to the dielectric layers, and whereinthe circuit layers have vertical portions and horizontal portions, thevertical portions of the circuit layers are directly and electricallyconnected to the conductive posts, and the dielectric layers are spacedbetween the horizontal portions of the circuit layers and thecorresponding first and second surfaces of the core layer structure. 5.The flip-chip packaging substrate of claim 4, wherein the insulatingportion is made of an organic dielectric material free of glass fiber oran inorganic dielectric material free of glass fiber.